Influence of block copolymer feature size on reactive ion etching pattern transfer into silicon

• Published in: Nanotechnology Vol. 28; no. 40; p. 404001
• Main Authors: Dialameh, M, Lupi, F Ferrarese, Imbraguglio, D, Zanenga, F, Lamperti, A, Martella, D, Seguini, G, Perego, M, Rossi, A M, De Leo, N, Boarino, L
• Format: Journal Article
• Language: English
• Published: England IOP Publishing 06.10.2017
• Subjects: block copolymers; cryogenic RIE; holey silicon; reactive ion etching; self-assembly
• ISSN: 0957-4484; 1361-6528
• DOI: 10.1088/1361-6528/aa8144

A successful realisation of sub-20 nm features on silicon (Si) is becoming the focus of many technological studies, strongly influencing the future performance of modern integrated circuits. Although reactive ion etching (RIE), at both micrometric and nanometric scale has already been the target of many studies, a better understanding of the different mechanisms involved at sub-20 nm size etching is still required. In this work, we investigated the influence of the feature size on the etch rate of Si, performed by a cryogenic RIE process through cylinder-forming polystyrene-block-polymethylmethacrylate (PS-b-PMMA) diblock copolymer (DBC) masks with diameter ranging between 19-13 nm. A sensible decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. For all the DBCs under investigation, we determined the process window useful for the correct transfer of the nanometric cylindrical pattern into a Si substrate. A structural and physicochemical investigation of the resulting nanostructured Si is reported in order to delineate the influence of various RIE pattern effects. Feature-size-dependent etch, or RIE-lag, is proved to significantly affect the obtained results.