Plasma-Etched Nanopore Polymer Films and Their Use as Templates to Prepare "Nano Test Tubes"
Open ended…︁ A plasma‐etch method, using a nanopore alumina film as the mask, was used to etch a replica of the alumina pore structure into the surface of a photoresist film; the thickness of the nanopore layer is controlled by the etch duration. The pores in such plasma‐etched films were then used...
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Published in | Small (Weinheim an der Bergstrasse, Germany) Vol. 3; no. 1; pp. 106 - 110 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Weinheim
WILEY-VCH Verlag
01.01.2007
WILEY‐VCH Verlag |
Subjects | |
Online Access | Get full text |
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Summary: | Open ended…︁ A plasma‐etch method, using a nanopore alumina film as the mask, was used to etch a replica of the alumina pore structure into the surface of a photoresist film; the thickness of the nanopore layer is controlled by the etch duration. The pores in such plasma‐etched films were then used as templates to prepare silica nano test tubes (see image). The length of the test tubes (as small as 380 nm) is determined by the thickness of the porous part of the photoresist film. |
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Bibliography: | This work was supported by NSF grant NIRT: For Biomedical Nanotube Technology, award number 0210580, and the Air Force Office of Scientific Research. istex:29EB248BFFB7122B79F5CAD6E9D86D0099898ABD ArticleID:SMLL200600267 ark:/67375/WNG-3JTK5JNM-H ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 ObjectType-Article-1 ObjectType-Feature-2 |
ISSN: | 1613-6810 1613-6829 |
DOI: | 10.1002/smll.200600267 |