Plasma-Etched Nanopore Polymer Films and Their Use as Templates to Prepare "Nano Test Tubes"

Open ended…︁ A plasma‐etch method, using a nanopore alumina film as the mask, was used to etch a replica of the alumina pore structure into the surface of a photoresist film; the thickness of the nanopore layer is controlled by the etch duration. The pores in such plasma‐etched films were then used...

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Published inSmall (Weinheim an der Bergstrasse, Germany) Vol. 3; no. 1; pp. 106 - 110
Main Authors Buyukserin, Fatih, Kang, Myungchan, Martin, Charles R.
Format Journal Article
LanguageEnglish
Published Weinheim WILEY-VCH Verlag 01.01.2007
WILEY‐VCH Verlag
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Summary:Open ended…︁ A plasma‐etch method, using a nanopore alumina film as the mask, was used to etch a replica of the alumina pore structure into the surface of a photoresist film; the thickness of the nanopore layer is controlled by the etch duration. The pores in such plasma‐etched films were then used as templates to prepare silica nano test tubes (see image). The length of the test tubes (as small as 380 nm) is determined by the thickness of the porous part of the photoresist film.
Bibliography:This work was supported by NSF grant NIRT: For Biomedical Nanotube Technology, award number 0210580, and the Air Force Office of Scientific Research.
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ArticleID:SMLL200600267
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ISSN:1613-6810
1613-6829
DOI:10.1002/smll.200600267