InAsSb thick epilayers applied to long wavelength photoconductors

InAs0.052Sb0.948 epilayers with cutoff wavelengths longer than 8 μm were successfully grown on InAs substrates using melt epitaxy (ME). Scanning electron microscopy observations show that the interface between the epilayers and substrates is flat, indicating the good quality of the epilayers, and th...

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Published inInternational journal of minerals, metallurgy and materials Vol. 20; no. 4; pp. 393 - 396
Main Authors Gao, Yu-zhu, Gong, Xiu-ying, Wu, Guang-hui, Feng, Yan-bin, Makino, Takamitsu, Kan, Hirofumi, Koyama, Tadanobu, Hayakawa, Yasuhiro
Format Journal Article
LanguageEnglish
Published Springer Berlin Heidelberg University of Science and Technology Beijing 01.04.2013
Springer Nature B.V
School of Electronics and Information Engineering, Tongji University, Shanghai 201804, China%Huaxing Infrared Device Co., Xi'an 712099, China%Hamamatsu Photonics K.K., Shizuoka 434-8601, Japan%Research Institute of Electronics, Shizuoka University, Shizuoka 432-8011, Japan
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Summary:InAs0.052Sb0.948 epilayers with cutoff wavelengths longer than 8 μm were successfully grown on InAs substrates using melt epitaxy (ME). Scanning electron microscopy observations show that the interface between the epilayers and substrates is flat, indicating the good quality of the epilayers, and the thickness of the epilayers is 40 μm. Photoconductors were fabricated using InAs0.052Sb0.948 thick epilayers grown by ME. Ge optical lenses were set on the photoconductors. At room temperature, the photoresponse wavelength range was 2-10μm. The peak detectivity Dλp reached 5.4 × 10^9 cm-Hz^1/2.W^-1 for the immersed detectors. The detectivity D^* was 9.3 × 10^8 and 1.3 × 10^8 cm.Hz^1/2.W^-1 at the wavelength of 8 and 9 μm, respectively. The good performance of the uncooled InAsSb detectors was experimentally validated.
Bibliography:semiconducting indium compounds; thick epilayers; long wavelength; photoconductors; detectivity
InAs0.052Sb0.948 epilayers with cutoff wavelengths longer than 8 μm were successfully grown on InAs substrates using melt epitaxy (ME). Scanning electron microscopy observations show that the interface between the epilayers and substrates is flat, indicating the good quality of the epilayers, and the thickness of the epilayers is 40 μm. Photoconductors were fabricated using InAs0.052Sb0.948 thick epilayers grown by ME. Ge optical lenses were set on the photoconductors. At room temperature, the photoresponse wavelength range was 2-10μm. The peak detectivity Dλp reached 5.4 × 10^9 cm-Hz^1/2.W^-1 for the immersed detectors. The detectivity D^* was 9.3 × 10^8 and 1.3 × 10^8 cm.Hz^1/2.W^-1 at the wavelength of 8 and 9 μm, respectively. The good performance of the uncooled InAsSb detectors was experimentally validated.
11-5787/T
ObjectType-Article-2
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content type line 23
ISSN:1674-4799
1869-103X
DOI:10.1007/s12613-013-0741-4