InAsSb thick epilayers applied to long wavelength photoconductors
InAs0.052Sb0.948 epilayers with cutoff wavelengths longer than 8 μm were successfully grown on InAs substrates using melt epitaxy (ME). Scanning electron microscopy observations show that the interface between the epilayers and substrates is flat, indicating the good quality of the epilayers, and th...
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Published in | International journal of minerals, metallurgy and materials Vol. 20; no. 4; pp. 393 - 396 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Springer Berlin Heidelberg
University of Science and Technology Beijing
01.04.2013
Springer Nature B.V School of Electronics and Information Engineering, Tongji University, Shanghai 201804, China%Huaxing Infrared Device Co., Xi'an 712099, China%Hamamatsu Photonics K.K., Shizuoka 434-8601, Japan%Research Institute of Electronics, Shizuoka University, Shizuoka 432-8011, Japan |
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Online Access | Get full text |
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Summary: | InAs0.052Sb0.948 epilayers with cutoff wavelengths longer than 8 μm were successfully grown on InAs substrates using melt epitaxy (ME). Scanning electron microscopy observations show that the interface between the epilayers and substrates is flat, indicating the good quality of the epilayers, and the thickness of the epilayers is 40 μm. Photoconductors were fabricated using InAs0.052Sb0.948 thick epilayers grown by ME. Ge optical lenses were set on the photoconductors. At room temperature, the photoresponse wavelength range was 2-10μm. The peak detectivity Dλp reached 5.4 × 10^9 cm-Hz^1/2.W^-1 for the immersed detectors. The detectivity D^* was 9.3 × 10^8 and 1.3 × 10^8 cm.Hz^1/2.W^-1 at the wavelength of 8 and 9 μm, respectively. The good performance of the uncooled InAsSb detectors was experimentally validated. |
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Bibliography: | semiconducting indium compounds; thick epilayers; long wavelength; photoconductors; detectivity InAs0.052Sb0.948 epilayers with cutoff wavelengths longer than 8 μm were successfully grown on InAs substrates using melt epitaxy (ME). Scanning electron microscopy observations show that the interface between the epilayers and substrates is flat, indicating the good quality of the epilayers, and the thickness of the epilayers is 40 μm. Photoconductors were fabricated using InAs0.052Sb0.948 thick epilayers grown by ME. Ge optical lenses were set on the photoconductors. At room temperature, the photoresponse wavelength range was 2-10μm. The peak detectivity Dλp reached 5.4 × 10^9 cm-Hz^1/2.W^-1 for the immersed detectors. The detectivity D^* was 9.3 × 10^8 and 1.3 × 10^8 cm.Hz^1/2.W^-1 at the wavelength of 8 and 9 μm, respectively. The good performance of the uncooled InAsSb detectors was experimentally validated. 11-5787/T ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 1674-4799 1869-103X |
DOI: | 10.1007/s12613-013-0741-4 |