Photocatalytic Activities of Amorphous TiO2-Cr Thin Films Prepared by Magnetron Sputtering

• Published in: Journal of Wuhan University of Technology. Materials science edition Vol. 23; no. 5; pp. 610 - 616
• Main Authors: Huang, Jiamu, Li, Yuexia, Cai, Xiaoping, Zhao, Pei
• Format: Journal Article
• Language: English
• Published: Heidelberg Wuhan University of Technology 01.10.2008; Springer Nature B.V; College of Materials Science and Engineering, Chongqing University, Chongqing 400045, China
• Subjects: Alloys; Chemistry and Materials Science; Materials Science; Photodegradation; Solar energy; Thin films; 光催化活性; 制备方法; 无定形二氧化钛-铬薄膜; 磁控管反应溅射法; amorphous TiO; magnetron sputtering; Cr thin films; threshold; TiO; photocatalysis; amorphous TiO2; TiO2-Cr thin films
• ISSN: 1000-2413; 1993-0437
• DOI: 10.1007/s11595-007-5610-1

Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method. The films deposited on glass slides at room temperature were investigated by atom force microscope, X-ray diffractometer, X-ray photoelectron spectroscopy, UV-Vis spectrophotometer, the photoluminescence （PL） and ellipse polarization apparatus. The results indicate that TiO2-Cr film exists in the form of amorphous. The prepared films possess a band gap of less than 3.20 eV, and a new absorption peak. The films, irradiated for 5 h under UV light, exhibit excellent photocatalytic activities with the optimum decomposition rate at 98.5% for methylene blue. Consequently, the thickness threshold on these films is 114 nm, at which the rate of photodegradation is 95% in 5 h. When the thickness is over 114 nm, the rate of photodegradation becomes stable. This result is completely different from that of crystalloid TiO2 thin film.