The effect of amorphous surface layers on images of crystals in high resolution transmission electron microscopy

The effect of a surface layer of amorphous silicon dioxide on images of crystalline silicon has been investigated for a range of crystal thicknesses varying from zero to 2 1 2 times that of the surface layer. It is shown that an amorphous surface produces fluctuations in image contrast which introdu...

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Bibliographic Details
Published inUltramicroscopy Vol. 16; no. 2; pp. 193 - 201
Main Authors Kilaas, R., Gronsky, R.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 1985
Elsevier Science
Subjects
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Other methods of structure determination
Physics
Structure of solids and liquids; crystallography
Electron micrography
High resolution
Transmission electron microscopy
Silicon Oxides
Silicon
Amorphous state
Coatings
Contrast
Thin film
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Summary:The effect of a surface layer of amorphous silicon dioxide on images of crystalline silicon has been investigated for a range of crystal thicknesses varying from zero to 2 1 2 times that of the surface layer. It is shown that an amorphous surface produces fluctuations in image contrast which introduces difficulties in the interpretation of defects in very thin specimens. These difficulties are less pronounced but still present in thicker crystals. It is also shown that an edge smoothly approaching zero thickness produces an image that changes gradually from crystalline to amorphous character.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0304-3991
1879-2723
DOI:10.1016/0304-3991(85)90073-7