Robust ferromagnetism and magneto-dielectric anomalies in (Al, Cr) co-doped iron oxide thin films-microwave mediated sol–gel approach
Research on thin films of iron oxide has gained interest in recent years because of its application in advanced spintronic and electronic devices. Technologically important iron oxide phases can be achieved by adopting novel methodologies and/or selecting suitable dopants. A cost-effective microwave...
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Published in | Journal of materials research and technology Vol. 26; pp. 6636 - 6651 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
01.09.2023
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Research on thin films of iron oxide has gained interest in recent years because of its application in advanced spintronic and electronic devices. Technologically important iron oxide phases can be achieved by adopting novel methodologies and/or selecting suitable dopants. A cost-effective microwave assisted sol–gel approach is adopted in this work to prepare thin films of iron oxide. Undoped and doped sols (2–10 wt% of dopant concentration) are irradiated with MW power of 720 W. Maghemite phase (γ-Fe2O3) is observed to be stable up to a co-dopant concentration of 6 wt%. Further increase in dopant content leads to a phase transition to mixed (γ-Fe2O3+Al2O3) crystal phases. Values of dielectric constant (DC) and loss tangent exhibit normal dispersion response with high DC value (log f 5.5 = ∼92) observed for undoped sample. Cole–Cole plots indicate the effective grain boundary contribution for low dopant concentrations, whereas contributions from grains is observed at higher dopant concentrations. M−H curves show ferromagnetic response with high value of saturation magnetization (Ms) of ∼450 emu/cm3 witnessed at 6 wt%. (Al, Cr) co-doping results in tuning of magnetic response/parameters. MD coupling of (Al, Cr) co-doped thin films of iron oxide makes this material suitable for advanced spintronic and energy storage devices. |
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ISSN: | 2238-7854 |
DOI: | 10.1016/j.jmrt.2023.08.263 |