CMOS Color-area matrix imagers: State of the art and prospects

The present state and prospects of the development of CMOS color-area matrix imagers are considered in view of the trends in CMOS technology and the possibilities for the development of complex-profile structures of photocells and image processing in single-chip sensors.

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Bibliographic Details
Published inJournal of communications technology & electronics Vol. 56; no. 3; pp. 351 - 356
Main Authors Vanyushin, I. V., Zimoglyad, V. A., Gergel’, V. A., Tishin, Yu. I.
Format Journal Article
LanguageEnglish
Published Dordrecht SP MAIK Nauka/Interperiodica 01.03.2011
Springer
Springer Nature B.V
Subjects
Analysis
CMOS
Color
Communications Engineering
Communications technology
Complementary metal oxide semiconductors
Design
Electronics
Engineering
Image processing
Light
Networks
Noise
Novel Radio Systems and Elements
Photoelectric cells
Random access memory
Sensors
State of the art
Studies
Transistors
Trends
Color Noise
Color Component
Color Separation
Floating Node
Spatial Nonuniformity
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Summary:The present state and prospects of the development of CMOS color-area matrix imagers are considered in view of the trends in CMOS technology and the possibilities for the development of complex-profile structures of photocells and image processing in single-chip sensors.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1064-2269
1555-6557
DOI:10.1134/S1064226911030132