Understanding focused ion beam guided anodic alumina nanopore development
[Display omitted] ► We study the effect of FIB patterning on pore evolution during anodization. ► FIB patterned concaves with 1.5nm depth can effectively guide nanopore growth. ► The edge effect of FIB guided patterns causes nanopores to bend. ► Anodization window is enlarged to 50–80V for 150nm int...
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Published in | Electrochimica acta Vol. 56; no. 27; pp. 9802 - 9807 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Kidlington
Elsevier Ltd
30.11.2011
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | [Display omitted]
► We study the effect of FIB patterning on pore evolution during anodization. ► FIB patterned concaves with 1.5nm depth can effectively guide nanopore growth. ► The edge effect of FIB guided patterns causes nanopores to bend. ► Anodization window is enlarged to 50–80V for 150nm interpore distance hexagonal arrays.
Focused ion beam (FIB) patterning in combination with anodization has shown great promise in creating unique pore patterns. This work is aimed to understand the effect of the FIB patterned sites in guiding anodized pore development. Highly ordered porous anodic alumina has been created with the guidance of FIB created patterns on electropolished aluminum followed by oxalic acid anodization. Shallow concaves created by the FIB with only 1.5nm depth can effectively guide the growth of ordered nanopore patterns. With the guidance of the FIB pattern, the anodization rate is much faster and the nanopore growth direction bends at the boundary of the FIB patterned and un-patterned regions. FIB patterning also enlarges the anodization window; ordered nanopore arrays with 150nm interpore distances can be produced under an applied potential from 50V to 80V. The fundamental understanding of these unique processes is discussed. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0013-4686 1873-3859 |
DOI: | 10.1016/j.electacta.2011.08.051 |