Plasma Polymerized Films for Sensor Devices

Miniaturization with semiconductor microfabrication or micromachining techniques is one of the main concerns in sensor technologies. For the combination of sensor and microelectronics technology, polymers should be fabricated in a mass‐producible and miniaturization‐conscious manner as an interface....

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Bibliographic Details
Published inElectroanalysis (New York, N.Y.) Vol. 12; no. 9; pp. 695 - 702
Main Authors Hiratsuka, Atsunori, Karube, Isao
Format Journal Article
LanguageEnglish
Published Weinheim VCH Verlagsgesellschaft mbH 01.05.2000
Subjects
Organic polymer
Plasma polymerization
Semiconductor process technology
Sensor
Thin film
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Summary:Miniaturization with semiconductor microfabrication or micromachining techniques is one of the main concerns in sensor technologies. For the combination of sensor and microelectronics technology, polymers should be fabricated in a mass‐producible and miniaturization‐conscious manner as an interface. The polymers fabricated in conventional manners could have potential problems, e.g., obtaining thin (<1 µm) and homogeneous films. Plasma‐polymerized films, which are made in a glow discharge or plasma in a vapor phase, offer a new alternative. This review describes the several characteristics, properties, and applications of plasma‐polymerized films in both chemical and biological fields.
Bibliography:istex:BE53B4EC23193A25A7E3551F59501D642B0138C2
ark:/67375/WNG-21NBSLS8-V
ArticleID:ELAN695
ISSN:1040-0397
1521-4109
DOI:10.1002/1521-4109(200005)12:9<695::AID-ELAN695>3.0.CO;2-4