Preparation and structural characterization of ZnO thin films by sol-gel method

• Published in: Journal of physics. Conference series Vol. 817; no. 1; pp. 12025 - 12031
• Main Authors: Aryanto, D, Jannah, W N, Masturi, Sudiro, T, Wismogroho, A S, Sebayang, P, Sugianto, Marwoto, P
• Format: Journal Article
• Language: English
• Published: Bristol IOP Publishing 10.04.2017
• Subjects: Crystal structure; Crystallization; Diffraction patterns; Dislocation density; Glass substrates; Grain size; Lattice parameters; Lattice strain; Morphology; Physics; Precursors; Scanning electron microscopy; Sol-gel processes; Spin coating; Structural analysis; Thickness; Thin films; Unit cell; Wurtzite; X-ray diffraction; Zinc coatings; Zinc oxide
• ISSN: 1742-6588; 1742-6596
• DOI: 10.1088/1742-6596/817/1/012025

ZnO thin films were prepared on glass substrate by sol-gel spin-coating method using zinc-acetate dihydrate as precursor. Effect of precursor concentration on the morphological and structural of the films was investigated. The diffraction patterns of X-ray diffraction (XRD) characterization indicated that all of ZnO thin films were polycrystalline with a hexagonal wurtzite crystal structure. The peaks were indexed to (100), (002) and (101) planes. Intensity of all diffraction peaks increased and became broader in full width at half maximum (FWHM) values with increasing precursor concentration. The calculation of texture coefficient (TC) indicated that ZnO thin films exhibited the preferential orientation growth along the c-axis. Increasing precursor concentration resulted in decreasing crystalline size and crystallization of the film. The lattice constants (a and c) and d-spacing also changed as function of precursor concentration. It was demonstrated by the bond length, volume per unit cell, lattice strain and dislocation density. The scanning electron microscopy (SEM) images of surface morphology of the films confirmed the results of XRD characterization. The grain size of ZnO thin films decreased as result of increasing precursor concentration. Cross-section of SEM images showed that the thickness of ZnO thin film increases from 149.4 nm to 447.7 nm with increasing precursor concentration. This works shown that morphological and structural of ZnO thin films prepared using sol-gel spin coating methods were strongly influenced by precursor concentration.