MBE fabrication of III-N-based laser diodes and its development to industrial system

We present recent progress in the growth of nitride based laser diodes (LDs) made by Plasma Assisted Molecular Beam Epitaxy (PAMBE). In this work we demonstrate continuous wave (cw) LDs grown by PAMBE operating in the range 430–460nm. The LDs were grown on c-plane bulk GaN substrates with threading...

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Published inJournal of crystal growth Vol. 378; pp. 278 - 282
Main Authors Skierbiszewski, C., Siekacz, M., Turski, H., Muziol, G., Sawicka, M., Perlin, P., Wasilewski, Z.R., Porowski, S.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.09.2013
Elsevier
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Summary:We present recent progress in the growth of nitride based laser diodes (LDs) made by Plasma Assisted Molecular Beam Epitaxy (PAMBE). In this work we demonstrate continuous wave (cw) LDs grown by PAMBE operating in the range 430–460nm. The LDs were grown on c-plane bulk GaN substrates with threading dislocation densities (TDDs) ranging from 103cm−2 to 107cm−2. The low TDDs allowed fabrication of cw LDs with the lifetime exceeding 2000h at 10mW of optical output power. The maximum output power for these LDs was 80mW. We used AlGaN cladding-free design of LDs with InGaN waveguides. The key element to achieve lasing for wavelengths above 450nm was substantial increase of the nitrogen flux available for growth in PAMBE. The increase of N flux is beneficial for growth of efficient InGaN QWs, which allowed demonstration of optically pumped lasing from single quantum well InGaN laser structures at 501nm. ► True-blue InAlGaN laser diodes by plasma assisted molecular beam epitaxy. ► LDs operate at 450 – 460 nm in cw mode with optical output power up to 80 mW. ► The role of active nitrogen for growth of InGaN is investigated.
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ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2012.12.116