High-rate deposition of silicon films in a magnetron discharge with liquid target

Silicon coatings have been deposited on substrates made of low-carbon and high- carbon steels and tungsten in a magnetron discharge with liquid target at substrate bias voltages ranging from +100 V to -600 V. The structure of obtained coatings was examined by a scanning electron microscopy. The stro...

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Bibliographic Details
Published inJournal of physics. Conference series Vol. 768; no. 1; pp. 12015 - 12018
Main Authors Tumarkin, A, Zibrov, M, Khodachenko, G, Tumarkina, D
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.10.2016
Subjects
Bias
Carbon steels
Corrosion resistance
Corrosion resistant steels
Discharge
High temperature
Oxidation resistance
Physics
Protective coatings
Silicon films
Tungsten
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Summary:Silicon coatings have been deposited on substrates made of low-carbon and high- carbon steels and tungsten in a magnetron discharge with liquid target at substrate bias voltages ranging from +100 V to -600 V. The structure of obtained coatings was examined by a scanning electron microscopy. The strong influence of substrate bias voltage on the coating structure was observed. The corrosion resistance of coated steel samples was examined in concentrated sulphuric, hydrochloric and nitric acids and their solutions. The resistance of coated tungsten samples against high-temperature oxidation was examined by their exposure to O2 gas at a pressure of 0.2 Pa and a temperature of 1073 K. The coatings deposited under bias voltages of+100 V and -600 V had dense structures and showed the best protective properties among all deposited coatings.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/768/1/012015