Cleaning of the dielectric surfaces using a controlled gas-discharge source of fast neutral particles

In the present work is proposed the design of a controlled gas-discharge source of fast neutral particles, allowing to clean surfaces of dielectric and semiconductor materials. Also are shown the results of the research of the source main working characteristics.

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Bibliographic Details
Published inJournal of physics. Conference series Vol. 872; no. 1; pp. 12021 - 12024
Main Authors Fadeev, A S, Talanov, A S, Kostrin, D K, Trifonov, S A, Lisenkov, A A, Goncharov, V D
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.07.2017
Subjects
Cleaning
Discharge
Neutral particles
Physics
Semiconductor materials
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Summary:In the present work is proposed the design of a controlled gas-discharge source of fast neutral particles, allowing to clean surfaces of dielectric and semiconductor materials. Also are shown the results of the research of the source main working characteristics.
ISSN:1742-6588
1742-6596
1742-6596
DOI:10.1088/1742-6596/872/1/012021