Topotactic fluorination of strontium iron oxide thin films using polyvinylidene fluoride

We report herein the topotactic fluorination of SrFeO 3−δ thin films ( δ ∼ 0, 0.5, 1) with polyvinylidene fluoride (PVDF). SrFeO 3−x F x epitaxial thin films were obtained by fluorination at 150–270 °C, which is substantially lower than the reaction temperature for polycrystalline bulk samples prepa...

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Published inJournal of materials chemistry. C, Materials for optical and electronic devices Vol. 2; no. 27; pp. 5350 - 5356
Main Authors Katayama, T., Chikamatsu, A., Hirose, Y., Takagi, R., Kamisaka, H., Fukumura, T., Hasegawa, T.
Format Journal Article
LanguageEnglish
Published 2014
Subjects
Epitaxy
Fluorination
Iron oxides
Polyvinylidene fluorides
Precursors
Strontium
Thin films
Vacancies
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Summary:We report herein the topotactic fluorination of SrFeO 3−δ thin films ( δ ∼ 0, 0.5, 1) with polyvinylidene fluoride (PVDF). SrFeO 3−x F x epitaxial thin films were obtained by fluorination at 150–270 °C, which is substantially lower than the reaction temperature for polycrystalline bulk samples prepared with PVDF. The fluorine content ( x ) of the film was widely varied by controlling the PVDF-treatment temperature and/or the amount of oxygen vacancies in the precursor film. The higher reactivity of the SrFeO 2 and SrFeO 2.5 thin films can be reasonably explained by a fluorine-diffusion mechanism via oxygen vacancies.
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ISSN:2050-7526
2050-7534
DOI:10.1039/C4TC00558A