Formation of Micro-Patterning Ferroelectric Films

The photosensitive PLZT gel films were prepared by chemical modified sol-gel process, and then were irradiated by double-beam of He-Cd UV laser in different direction and twice irradiation, subsequently, the array of PLZT gel film was obtained by leaching the irradiated gel film in ethanol. Finally,...

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Bibliographic Details
Published inFerroelectrics Vol. 357; no. 1; pp. 28 - 34
Main Authors Zhao, Gaoyang, Zhang, Weihua, Deng, Xiaocui, Xu, Guomin
Format Journal Article Conference Proceeding
LanguageEnglish
Published London Taylor & Francis Group 01.01.2007
Taylor and Francis
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Summary:The photosensitive PLZT gel films were prepared by chemical modified sol-gel process, and then were irradiated by double-beam of He-Cd UV laser in different direction and twice irradiation, subsequently, the array of PLZT gel film was obtained by leaching the irradiated gel film in ethanol. Finally, the array of ferroelectric films was obtained after heat treatment, the dot area and thickness of which are 500 nm × 500 nm and 50 nm with pitch of 1000 nm. The results of AFM and TF-Analyzer 2000 online-test indicate that the ferroelectric dots are of the polarization reversal, and exhibit the ferroelectric behaviors.
Bibliography:SourceType-Scholarly Journals-2
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ObjectType-Conference Paper-1
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SourceType-Conference Papers & Proceedings-1
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ISSN:0015-0193
1563-5112
DOI:10.1080/00150190701527498