Formation of Micro-Patterning Ferroelectric Films
The photosensitive PLZT gel films were prepared by chemical modified sol-gel process, and then were irradiated by double-beam of He-Cd UV laser in different direction and twice irradiation, subsequently, the array of PLZT gel film was obtained by leaching the irradiated gel film in ethanol. Finally,...
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Published in | Ferroelectrics Vol. 357; no. 1; pp. 28 - 34 |
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Main Authors | , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
London
Taylor & Francis Group
01.01.2007
Taylor and Francis |
Subjects | |
Online Access | Get full text |
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Summary: | The photosensitive PLZT gel films were prepared by chemical modified sol-gel process, and then were irradiated by double-beam of He-Cd UV laser in different direction and twice irradiation, subsequently, the array of PLZT gel film was obtained by leaching the irradiated gel film in ethanol. Finally, the array of ferroelectric films was obtained after heat treatment, the dot area and thickness of which are 500 nm × 500 nm and 50 nm with pitch of 1000 nm. The results of AFM and TF-Analyzer 2000 online-test indicate that the ferroelectric dots are of the polarization reversal, and exhibit the ferroelectric behaviors. |
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Bibliography: | SourceType-Scholarly Journals-2 ObjectType-Feature-2 ObjectType-Conference Paper-1 content type line 23 SourceType-Conference Papers & Proceedings-1 ObjectType-Article-3 |
ISSN: | 0015-0193 1563-5112 |
DOI: | 10.1080/00150190701527498 |