Concurrent synthesis and boron-doping of amorphous carbon films by focused ion beam-assisted chemical vapor deposition

• Published in: Thin solid films Vol. 730; p. 138704
• Main Authors: Matsumoto, Ryo, Sadki, El Hadi S., Tanaka, Hiromi, Yamamoto, Sayaka, Adachi, Shintaro, Younis, Adnan, Takeya, Hiroyuki, Takano, Yoshihiko
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 31.07.2021
• Subjects: Amorphous carbon film; Boron doping; Chemical vapor deposition; Focused ion beam; Amorphous carbon film; Chemical vapor deposition; Boron doping; Focused ion beam
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2021.138704

•Boron-doped carbon films via focused ion beam induced chemical vapor deposition.•Concurrent deposition, boron doping, and patterning of boron-doped carbon films.•Lithography-free patterning of boron-doped carbon films. A method to directly deposit boron-doped amorphous carbon films via focused ion beam-assisted chemical vapor deposition is reported. The presence of boron in the deposited films was verified by X-ray photoelectron spectroscopy. Raman spectroscopy analysis confirmed the amorphousity of the films. The as-deposited films exhibited typical semiconducting behavior from electrical resistance versus temperature measurements. The presented fabrication technique is a one step process for the simultaneous deposition, boron-doping, and patterning of the films, and hence may offer an effective way to directly fabricate boron-doped amorphous carbon-based devices without the need for templates, which is highly advantageous for applications.