Investigation of stability and charge state of Ne and Ar gas field ion source by time-of-flight mass spectrometry

Charge state distribution of the working gases of the Ar and Ne gas field ion source (GFIS) were investigated by the time-of-flight mass spectrometry using a newly designed experimental system. GIFS emitters having few atoms on the top of the (111) surface of tungsten were formed by a remolding and...

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Published inJapanese Journal of Applied Physics Vol. 53; no. 5; pp. 58004 - 1-058004-3
Main Authors Nagai, Shigekazu, Iwata, Tatsuo, Okawa, Ryuta, Kajiwara, Kazuo, Hata, Koichi
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.05.2014
Subjects
Charge
Emitters
Etching
Evaporation
Fluctuation
Ground fault interruptions
Ion sources
Mass spectrometry
Standard deviation
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Summary:Charge state distribution of the working gases of the Ar and Ne gas field ion source (GFIS) were investigated by the time-of-flight mass spectrometry using a newly designed experimental system. GIFS emitters having few atoms on the top of the (111) surface of tungsten were formed by a remolding and field evaporation sequence with electrochemically etched oriented tip. At a probe current of about 1 pA, the ratio of standard deviation of fluctuation and average ion current <2.5% was recorded from a single atom terminated emitter of the Ar GFIS. Mass analysis by the time-of-flight spectrometer showed that there were only singly charged ions both of the Ne and Ar GFIS. Furthermore, no impurity gas ion was detected in the mass spectrum.
Bibliography:ObjectType-Article-1
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.53.058004