Flow behavior at the embossing stage of nanoimprint lithography

Nanoimprint lithography (NIL) is a nanofabrication method known to be a low cost method of fabricating nanoscale patterns as small as 6 nm. This study is focused on understanding physical phenomena in the embossing of nano/micro scale structures with 100 nm minimum feature size. We present the effec...

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Bibliographic Details
Published inFibers and polymers Vol. 3; no. 3; pp. 113 - 119
Main Authors Jeong, Jun-Ho, Choi, Youn-Suk, Shin, Young-Jae, Lee, Jae-Jong, Park, Kyoung-Taik, Lee, Eung-Sug, Lee, Sang-Rok
Format Journal Article
LanguageEnglish
Published Dordrecht Springer Nature B.V 01.09.2002
Subjects
Embossing
Experimentation
Grooves
Lithography
Nanocomposites
Nanofabrication
Nanolithography
Nanomaterials
Nanostructure
Polymers
Studies
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Summary:Nanoimprint lithography (NIL) is a nanofabrication method known to be a low cost method of fabricating nanoscale patterns as small as 6 nm. This study is focused on understanding physical phenomena in the embossing of nano/micro scale structures with 100 nm minimum feature size. We present the effects of capillary force and width of stamp groove on flow behavior at the embossing stage through numerical experimentation. We also compare our numerical results with previous experimental results and discuss our results.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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ISSN:1229-9197
1875-0052
DOI:10.1007/BF02892627