Structural properties of transparent Ti-V oxide semiconductor thin films

Transparent oxide semiconducting thin films based on mixed Ti-V oxides were prepared using a modified reactive magnetron sputtering method. Based on structural investigations performed with the help of x-ray diffraction and transmission electron microscopy analysis, two distinct regions in the prepa...

Full description

Saved in:
Bibliographic Details
Published inCentral European journal of physics Vol. 11; no. 2; pp. 251 - 257
Main Authors Sieradzka, Karolina, Kaczmarek, Danuta, Morgiel, Jerzy, Domaradzki, Jaroslaw, Prociow, Eugeniusz, Adamiak, Bogdan
Format Journal Article
LanguageEnglish
Published Heidelberg SP Versita 01.02.2013
Versita
De Gruyter
Subjects
Online AccessGet full text

Cover

Loading…