High temperature plasma immersion ion implantation of Ti6Al4V

We have performed high temperature nitrogen plasma immersion ion implantation (PIII) of Ti6Al4V by heating the samples for up to 800 °C, using tungsten filaments inside the sample holder. Ion implantation was done with the high voltage pulser at 5 kV, 40 μs duration and 400 Hz frequency, and a nitro...

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Published inSurface & coatings technology Vol. 201; no. 9; pp. 4953 - 4956
Main Authors Ueda, M., Silva, M.M., Lepienski, C.M., Soares, P.C., Gonçalves, J.A.N., Reuther, H.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier B.V 26.02.2007
Elsevier
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Summary:We have performed high temperature nitrogen plasma immersion ion implantation (PIII) of Ti6Al4V by heating the samples for up to 800 °C, using tungsten filaments inside the sample holder. Ion implantation was done with the high voltage pulser at 5 kV, 40 μs duration and 400 Hz frequency, and a nitrogen glow discharge as the plasma source. Nanoindentation analysis of the treated surface indicated an improvement of 5 times in hardness for PIII treatment of 120 min. X-ray diffraction indicated the formation of Ti 2N. Auger Electron Spectroscopy (AES) showed that the peak concentration is greater than 30% in the implanted nitrogen with the maximum penetration of 150 nm for the sample treated during 120 min.
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ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2006.07.074