High temperature plasma immersion ion implantation of Ti6Al4V
We have performed high temperature nitrogen plasma immersion ion implantation (PIII) of Ti6Al4V by heating the samples for up to 800 °C, using tungsten filaments inside the sample holder. Ion implantation was done with the high voltage pulser at 5 kV, 40 μs duration and 400 Hz frequency, and a nitro...
Saved in:
Published in | Surface & coatings technology Vol. 201; no. 9; pp. 4953 - 4956 |
---|---|
Main Authors | , , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Lausanne
Elsevier B.V
26.02.2007
Elsevier |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | We have performed high temperature nitrogen plasma immersion ion implantation (PIII) of Ti6Al4V by heating the samples for up to 800 °C, using tungsten filaments inside the sample holder. Ion implantation was done with the high voltage pulser at 5 kV, 40 μs duration and 400 Hz frequency, and a nitrogen glow discharge as the plasma source. Nanoindentation analysis of the treated surface indicated an improvement of 5 times in hardness for PIII treatment of 120 min. X-ray diffraction indicated the formation of Ti
2N. Auger Electron Spectroscopy (AES) showed that the peak concentration is greater than 30% in the implanted nitrogen with the maximum penetration of 150 nm for the sample treated during 120 min. |
---|---|
Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 ObjectType-Article-2 ObjectType-Feature-1 |
ISSN: | 0257-8972 1879-3347 |
DOI: | 10.1016/j.surfcoat.2006.07.074 |