Si–Zr alloy thin-film anodes for microbatteries
Zr–Si thin films were deposited on copper substrates by co-sputtering method of two pure targets. The structure and surface morphology of the films have been characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). The composition was measured by Rutherford backscattering spectros...
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Published in | Journal of power sources Vol. 119; pp. 113 - 116 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
01.06.2003
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Subjects | |
Online Access | Get full text |
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Summary: | Zr–Si thin films were deposited on copper substrates by co-sputtering method of two pure targets. The structure and surface morphology of the films have been characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). The composition was measured by Rutherford backscattering spectroscopy (RBS) and energy-dispersive X-ray spectroscopy (EDS). The electrochemical results showed that alloying with Zr improves the cycling performance, while as a result the reversible capacity decreases. It appears that the electrochemical cycling performance can be further improved by controlling the film deposition conditions such as substrate temperature and bias sputtering. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0378-7753 1873-2755 |
DOI: | 10.1016/S0378-7753(03)00137-X |