Si–Zr alloy thin-film anodes for microbatteries

Zr–Si thin films were deposited on copper substrates by co-sputtering method of two pure targets. The structure and surface morphology of the films have been characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). The composition was measured by Rutherford backscattering spectros...

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Bibliographic Details
Published inJournal of power sources Vol. 119; pp. 113 - 116
Main Authors Lee, Seung-Joo, Lee, Heon-Young, Baik, Hong-Koo, Lee, Sung-Man
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.06.2003
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Summary:Zr–Si thin films were deposited on copper substrates by co-sputtering method of two pure targets. The structure and surface morphology of the films have been characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). The composition was measured by Rutherford backscattering spectroscopy (RBS) and energy-dispersive X-ray spectroscopy (EDS). The electrochemical results showed that alloying with Zr improves the cycling performance, while as a result the reversible capacity decreases. It appears that the electrochemical cycling performance can be further improved by controlling the film deposition conditions such as substrate temperature and bias sputtering.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0378-7753
1873-2755
DOI:10.1016/S0378-7753(03)00137-X