Structural and magnetic characterization of martensitic Ni–Mn–Ga thin films deposited on Mo foil

Three martensitic Ni 51.4Mn 28.3Ga 20.3 thin films sputter-deposited on a Mo foil were investigated with regard to their crystal and magnetic domain structures, as well as their magnetic and magnetostrain properties. The film thicknesses, d, were 0.1, 0.4 and 1.0μm. X-ray and electron diffraction pa...

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Published inActa materialia Vol. 54; no. 20; pp. 5461 - 5467
Main Authors Chernenko, V.A., Anton, R. Lopez, Kohl, M., Barandiaran, J.M., Ohtsuka, M., Orue, I., Besseghini, S.
Format Journal Article
LanguageEnglish
Published Oxford Elsevier Ltd 01.12.2006
Elsevier Science
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Summary:Three martensitic Ni 51.4Mn 28.3Ga 20.3 thin films sputter-deposited on a Mo foil were investigated with regard to their crystal and magnetic domain structures, as well as their magnetic and magnetostrain properties. The film thicknesses, d, were 0.1, 0.4 and 1.0μm. X-ray and electron diffraction patterns revealed a tetragonal modulated martensitic phase (10 M) in the films. The surface topography and micromagnetic structure were studied by scanning probe microscopy. A maze magnetic domain structure featuring a large out-of-plane magnetization component was found in all films. The domain width, δ, depends on the film thickness as δ ∼ d . The thickness dependencies of the saturation magnetization, saturation magnetic field and magnetic anisotropy were clarified. Beam cantilever tests on the Ni–Mn–Ga/Mo composite as a function of magnetic field showed reversible strains, which are larger than ordinary magnetostriction.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1359-6454
1873-2453
DOI:10.1016/j.actamat.2006.06.058