Structure and electronic properties of SiC thin-films deposited by RF magnetron sputtering

• Published in: Transactions of Nonferrous Metals Society of China Vol. 17; no. 2; pp. 373 - 377
• Main Author: 周继承 郑旭强
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.04.2007; School of Physics Science and Technology, Central South University, Changsha 410083, China
• Subjects: amorphous SiC thin-films; electron excitation energy; resistivity; RF-磁控管溅射法; SiC薄膜; surface morphology; 电学性质; surface morphology; amorphous SiC thin-films; electron excitation energy; resistivity

SiC thin-films were prepared by RF-magnetron sputtering technique（RMS） with the target of single crystalline SiC and then annealed. The surface morphology of thin-films was characterized by AFM. The result shows that the surface of the thin-films is smooth and compact; XRD analysis reveals that the...