Growth kinetics of plasma-polymerized films

The growth kinetics of polymer thin films prepared by plasma-based deposition method were explored using atomic force microscopy. The growth behavior of the first layer of the polythiophene somewhat differs from that of the other layers because the first layer is directly deposited on the substrate,...

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Published inScientific reports Vol. 5; no. 1; p. 11201
Main Authors Hwang, Sukyoung, Seo, Hosung, Jeong, Dong-Cheol, Wen, Long, Han, Jeon Geon, Song, Changsik, Kim, Yunseok
Format Journal Article
LanguageEnglish
Published England Nature Publishing Group 18.06.2015
Subjects
Alloys
Atomic force microscopy
Kinetics
Plasma
Thin films
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Summary:The growth kinetics of polymer thin films prepared by plasma-based deposition method were explored using atomic force microscopy. The growth behavior of the first layer of the polythiophene somewhat differs from that of the other layers because the first layer is directly deposited on the substrate, whereas the other layers are deposited on the polymer itself. After the deposition of the first layer, each layer is formed with a cycle of 15 s. The present work represents the growth kinetics of the plasma-polymerized films and could be helpful for further studies on growth kinetics in other material systems as well as for applications of plasma-polymerized thin films.
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These authors contributed equally to this work.
ISSN:2045-2322
2045-2322
DOI:10.1038/srep11201