Microscopical analysis of structure and work function of Ba-covered Si(111)-(7×7) surface

• Published in: Applied surface science Vol. 146; no. 1; pp. 158 - 161
• Main Authors: Komai, Masaaki, Sasaki, Masahiro, Ozawa, Ryo, Yamamoto, Shigehiko
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01.05.1999; Elsevier Science
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; Electronic transport in interface structures; Exact sciences and technology; Local tunneling barrier height, LBH; Physics; STM; Work function; BC; Work function; SF; SBA; Si; Local tunneling barrier height, LBH; STM; WE; Ba; Surface reconstruction; Barium; Work functions; Adsorption; Tunnel effect; Property structure relationship; Silicon; Barrier height; Experimental study; Surface structure
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/S0169-4332(99)00010-0

Microscopic `work function' is evaluated by local tunneling barrier height (LBH) measurements of clean and Ba-deposited Si(111) surfaces in order to clarify the mechanism of work function reduction by Ba deposition. Atomically resolved LBH images are obtained corresponding to scanning tunneling microscopy (STM) images. The difference in the LBH measurement for clean Si(111)-(7×7) and Ba deposited Si(111)-(3×1) surfaces agrees with macroscopic work function reduction due to Ba adsorbate. The result suggests that the work function is strongly related to the atomic arrangement of the Si(111) surface induced by Ba deposition.