Temperature-dependent nitrogen configuration of N-doped graphene by chemical vapor deposition
The N-doped graphene domain is synthesized through co-growth of ammonia and methane by chemical vapor deposition (CVD). Results showed that the nitrogen concentration, defect density, and doping level increased with the decrease in growth temperature. Notably, the position of N1s main peak from X-ra...
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Published in | Carbon (New York) Vol. 81; pp. 814 - 820 |
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Abstract | The N-doped graphene domain is synthesized through co-growth of ammonia and methane by chemical vapor deposition (CVD). Results showed that the nitrogen concentration, defect density, and doping level increased with the decrease in growth temperature. Notably, the position of N1s main peak from X-ray photoelectron spectroscopy (XPS) showed a significant linear blueshift as the temperature decreased, indicating that the main doping nitrogen configuration gradually evolved from pyridinic N to pyrrolic N consistent with the theoretical explanation. In addition, the nitrogen configuration was not influenced by the NH3 flow rate, which was mainly pyridinic N at the high temperature. With increasing NH3 flow rate the redshift of the Raman peak was caused by the elongation of the CC bonds. This work presented a process to control the predominant bonding configuration of doping nitrogen by mainly choosing the growth temperature through CVD. |
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AbstractList | The N-doped graphene domain is synthesized through co-growth of ammonia and methane by chemical vapor deposition (CVD). Results showed that the nitrogen concentration, defect density, and doping level increased with the decrease in growth temperature. Notably, the position of N1s main peak from X-ray photoelectron spectroscopy (XPS) showed a significant linear blueshift as the temperature decreased, indicating that the main doping nitrogen configuration gradually evolved from pyridinic N to pyrrolic N consistent with the theoretical explanation. In addition, the nitrogen configuration was not influenced by the NH3 flow rate, which was mainly pyridinic N at the high temperature. With increasing NH3 flow rate the redshift of the Raman peak was caused by the elongation of the CC bonds. This work presented a process to control the predominant bonding configuration of doping nitrogen by mainly choosing the growth temperature through CVD. The N-doped graphene domain is synthesized through co-growth of ammonia and methane by chemical vapor deposition (CVD). Results showed that the nitrogen concentration, defect density, and doping level increased with the decrease in growth temperature. Notably, the position of N1s main peak from X-ray photoelectron spectroscopy (XPS) showed a significant linear blueshift as the temperature decreased, indicating that the main doping nitrogen configuration gradually evolved from pyridinic N to pyrrolic N consistent with the theoretical explanation. In addition, the nitrogen configuration was not influenced by the NH sub(3) flow rate, which was mainly pyridinic N at the high temperature. With increasing NH sub(3) flow rate the redshift of the Raman peak was caused by the elongation of the C-C bonds. This work presented a process to control the predominant bonding configuration of doping nitrogen by mainly choosing the growth temperature through CVD. |
Author | Sui, Yanping Zhu, Bo Xie, Xiaoming Yu, Guanghui Zhang, Yanhui Zhang, Yaqian Jin, Zhi Wang, Bin Chen, Zhiying Tang, Chunmiao Liu, Xinyu Zhang, Haoran Shu, Haibo |
Author_xml | – sequence: 1 givenname: Yanping surname: Sui fullname: Sui, Yanping organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 2 givenname: Bo surname: Zhu fullname: Zhu, Bo organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 3 givenname: Haoran surname: Zhang fullname: Zhang, Haoran organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 4 givenname: Haibo surname: Shu fullname: Shu, Haibo organization: College of Optical and Electronic Technology, China Jiliang University, 310018 Hangzhou, China – sequence: 5 givenname: Zhiying surname: Chen fullname: Chen, Zhiying organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 6 givenname: Yanhui surname: Zhang fullname: Zhang, Yanhui organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 7 givenname: Yaqian surname: Zhang fullname: Zhang, Yaqian organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 8 givenname: Bin surname: Wang fullname: Wang, Bin organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 9 givenname: Chunmiao surname: Tang fullname: Tang, Chunmiao organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 10 givenname: Xiaoming surname: Xie fullname: Xie, Xiaoming organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 11 givenname: Guanghui surname: Yu fullname: Yu, Guanghui email: ghyu@mail.sim.ac.cn organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 200050 Shanghai, China – sequence: 12 givenname: Zhi surname: Jin fullname: Jin, Zhi organization: Microwave Devices and Integrated Circuits Department, Institute of Microelectronics, Chinese Academy of Sciences, 100029 Beijing, China – sequence: 13 givenname: Xinyu surname: Liu fullname: Liu, Xinyu organization: Microwave Devices and Integrated Circuits Department, Institute of Microelectronics, Chinese Academy of Sciences, 100029 Beijing, China |
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Keywords | CVD Temperature dependence Temperature effects Graphene Doping Doped materials Nitrogen additions Nitrogen |
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Snippet | The N-doped graphene domain is synthesized through co-growth of ammonia and methane by chemical vapor deposition (CVD). Results showed that the nitrogen... |
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SubjectTerms | ammonia Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science; rheology Density Doping Elongation Exact sciences and technology Flow rate Fullerenes and related materials; diamonds, graphite Graphene Materials science Methane Methods of deposition of films and coatings; film growth and epitaxy nitrogen nitrogen content Physics Specific materials temperature vapors X-ray photoelectron spectroscopy |
Title | Temperature-dependent nitrogen configuration of N-doped graphene by chemical vapor deposition |
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