Ordering-induced electron accumulation at GaInP/GaAs hetero-interfaces

Hetero-junctions between GaAs and GaInP were investigated, which had been grown by metal organic vapor-phase epitaxy (MOVPE) at a wide range of temperatures such that the GaInP had different long-range-order parameter ( η) values. Electron depth-profiles in the samples were characterized by capacita...

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Bibliographic Details
Published inJournal of crystal growth Vol. 221; no. 1; pp. 515 - 519
Main Authors Tanaka, Takeshi, Takano, Kazuto, Tsuchiya, Tadayoshi, Sakaguchi, Harunori
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.12.2000
Elsevier
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Summary:Hetero-junctions between GaAs and GaInP were investigated, which had been grown by metal organic vapor-phase epitaxy (MOVPE) at a wide range of temperatures such that the GaInP had different long-range-order parameter ( η) values. Electron depth-profiles in the samples were characterized by capacitance–voltage ( C– V) measurement, and delta-shaped electron accumulation was observed at the interface between GaAs and GaInP, although both layers were grown undoped. It has been proven that the sheet concentration of this unexpected electron accumulation is strongly dependent on the η value of GaInP. Macroscopic polarization, caused by spontaneously polarized gallium-rich clusters in ordered GaInP, is attributed as being the reason for this electron accumulation.
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(00)00754-5