Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth

In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achieves up to a 16.4% increase in the growth per cy...

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Published inNanomaterials (Basel, Switzerland) Vol. 13; no. 24; p. 3110
Main Authors Chaves, João, Chiappim, William, Karnopp, Júlia, Neto, Benedito, Leite, Douglas, da Silva Sobrinho, Argemiro, Pessoa, Rodrigo
Format Journal Article
LanguageEnglish
Published Basel MDPI AG 01.12.2023
Subjects
alumina
Aluminum oxide
atomic layer deposition
Atomic layer epitaxy
Atomic properties
Carbon content
Deionization
Dentistry
Film growth
growth per cycle
Hydrogen peroxide
Mass spectrometry
Mass spectroscopy
Nanoparticles
Nitrates
Nitrogen
Oxidation
Plasma
plasma-activated water
Reactive oxygen species
Silicon substrates
Spectrum analysis
Stoichiometry
Thin films
United States > US
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Summary:In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achieves up to a 16.4% increase in the growth per cycle (GPC) of Al2O3 films, consistent with results from plasma-enhanced atomic layer deposition (PEALD). Time-resolved mass spectrometry (TRMS) revealed disparities in CH4 partial pressures between TMA reactions with DI water and PAW, with PAW demonstrating enhanced reactivity. Reactive oxygen species (ROS), namely H2O2 and O3, are posited to activate Si(100) substrate sites, thereby improving GPC and film quality. Specifically, Al2O3 films grown with PAW pH = 3.1 displayed optimal stoichiometry, reduced carbon content, and an expanded bandgap. This study thus establishes “PAW-ALD” as a descriptor for this ALD variation and highlights the significance of comprehensive assessments of PAW in ALD processes.
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ISSN:2079-4991
2079-4991
DOI:10.3390/nano13243110