Helium ion microscopy

Helium ion microcopy based on gas field ion sources represents a new ultrahigh resolution microscopy and nanofabrication technique. It is an enabling technology that not only provides imagery of conducting as well as uncoated insulating nanostructures but also allows to create these features. The la...

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Bibliographic Details
Published inJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Vol. 32; no. 2
Main Authors Hlawacek, Gregor, Veligura, Vasilisa, van Gastel, Raoul, Poelsema, Bene
Format Journal Article
LanguageEnglish
Published 01.03.2014
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Summary:Helium ion microcopy based on gas field ion sources represents a new ultrahigh resolution microscopy and nanofabrication technique. It is an enabling technology that not only provides imagery of conducting as well as uncoated insulating nanostructures but also allows to create these features. The latter can be achieved using resists or material removal due to sputtering. The close to free-form sculpting of structures over several length scales has been made possible by the extension of the method to other gases such as neon. A brief introduction of the underlying physics as well as a broad review of the applicability of the method is presented in this review.
ISSN:2166-2746
1520-8567
2166-2754
DOI:10.1116/1.4863676