Polyurethane triblock copolymer gate dielectrics for low-voltage organic thin-film transistors

• Published in: Journal of industrial and engineering chemistry (Seoul, Korea) Vol. 71; pp. 460 - 464
• Main Authors: Kim, Dongkyu, Kim, Choongik, Earmme, Taeshik
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 25.03.2019; 한국공업화학회
• Subjects: Copolymer; Dielectric; Hysteresis; Organic thin-film transistors; Urethane; 화학공학; Urethane; Copolymer; Dielectric; Hysteresis; Organic thin-film transistors
• ISSN: 1226-086X; 1876-794X
• DOI: 10.1016/j.jiec.2018.12.003

Novel polyurethane triblock copolymers comprising polycaprolactone diol (PCL), 1,6-hexamethylene diisocyanate (HMDI), and polyethylene glycol (PEG) were synthesized for use as gate dielectric for organic thin-film transistors (OTFTs). Thin films of polyurethane gate dielectrics processed from soluti...