Polyurethane triblock copolymer gate dielectrics for low-voltage organic thin-film transistors
Novel polyurethane triblock copolymers comprising polycaprolactone diol (PCL), 1,6-hexamethylene diisocyanate (HMDI), and polyethylene glycol (PEG) were synthesized for use as gate dielectric for organic thin-film transistors (OTFTs). Thin films of polyurethane gate dielectrics processed from soluti...
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Published in | Journal of industrial and engineering chemistry (Seoul, Korea) Vol. 71; pp. 460 - 464 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
25.03.2019
한국공업화학회 |
Subjects | |
Online Access | Get full text |
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Summary: | Novel polyurethane triblock copolymers comprising polycaprolactone diol (PCL), 1,6-hexamethylene diisocyanate (HMDI), and polyethylene glycol (PEG) were synthesized for use as gate dielectric for organic thin-film transistors (OTFTs). Thin films of polyurethane gate dielectrics processed from solution exhibit excellent insulating properties (∼7×10−7A/cm2 at 1V) as well as large areal capacitance (170nF/cm2) with film thickness of ∼50nm. OTFTs are fabricated with representative n-channel organic semiconductor (N,N′-ditridecylperylene-3,4,9,10-tetracarboxylic diimide; PTCDI-C13) using the developed gate dielectrics, and the resulting devices show decent electrical performance with negligible hysteresis at low operating voltage of 1V. |
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ISSN: | 1226-086X 1876-794X |
DOI: | 10.1016/j.jiec.2018.12.003 |