Compound Bragg reflection filters made by spatial frequency doubling lithography

• Published in: Journal of lightwave technology Vol. 7; no. 9; pp. 1379 - 1385
• Main Authors: Henry, C.H., Shani, Y., Kistler, R.C., Jewell, T.E., Pol, V., Olsson, N.A., Kazarinov, R.F., Orlowsky, K.J.
• Format: Journal Article
• Language: English
• Published: New York, NY IEEE 01.09.1989; Institute of Electrical and Electronics Engineers
• Subjects: Applied sciences; Band pass filters; Circuit properties; Electric, optical and optoelectronic circuits; Electronics; Exact sciences and technology; Fabrication; Frequency; Gratings; Integrated optics. Optical fibers and wave guides; Lithography; Optical and optoelectronic circuits; Passband; Reflection; Resonance; Resonator filters; Silicon; Integrated optics; Microelectronic fabrication; Optical filter; Lithography; Bragg reflection; Photolithography; Reflection grating
• ISSN: 0733-8724; 1558-2213
• DOI: 10.1109/50.50717

A report is presented on the fabrication of complex Bragg filters with resonant wavelengths near 1.55 mu m, patterned by photolithography using a high-resolution deep ultraviolet stepper. The projection of gratings with quarter-micrometer features was made possible by the use of spatial frequency-doubling lithography. A single chip, processed entirely in the silicon facility, was used to demonstrate five Bragg reflectors of different wavelengths, a quarter-wave shifted resonator, broadband stacked filters with as many as 15 uniform Bragg reflector sections of different Bragg wavelengths, and broadband stacked filters containing a passband within the reflection band. The filters exhibited nearly ideal spectral behavior.< >