Structure and magnetic behavior of CoPt films prepared on MgO(001) substrates by dc plasma biased sputtering

CoPt films were prepared on MgO(001) substrates at 230 °C by d.c. sputtering. Both films on the unbiased and the biased (−150 V) substrates grow with the crystallographic orientation of CoPt(001)[100]//MgO(001)[100]. In fact, the unbiased film is deformed from the perfect face-centered cubic (fcc) s...

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Bibliographic Details
Published inThin solid films Vol. 459; no. 1; pp. 165 - 168
Main Authors Yamaguchi, Kenrou, Zhao, Zhongyu, Chen, Changchuan, Hashimoto, Mituru, Shi, Ji, Nakamura, Yoshio
Format Journal Article Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier B.V 01.07.2004
Elsevier Science
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Summary:CoPt films were prepared on MgO(001) substrates at 230 °C by d.c. sputtering. Both films on the unbiased and the biased (−150 V) substrates grow with the crystallographic orientation of CoPt(001)[100]//MgO(001)[100]. In fact, the unbiased film is deformed from the perfect face-centered cubic (fcc) structure towards the face-centered tetragonal (fct) structure with an incomplete ordered phase, while the biased film retains normally the fcc structure. Both films show the in-plane magnetic anisotropy with coercivity less than 1000 Oe. Upon the thermal anneal at 800 °C×30 min, the unbiased film is transformed completely into the L1o-fct structure while the biased film is transformed into the fct structure but not completely into the complete L1o structure. The unbiased film shows clearly the perpendicular magnetic anisotropy with the squareness equal to unity, while the biased film shows only the weaker perpendicular magnetic anisotropy with the squareness less than 0.7. The perpendicular coercivity is estimated at 3200 Oe for the unbiased film and 2200 Oe for the biased film.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2003.12.124