Surface smoothing of diamond membranes by reactive ion etching process
This paper describes a procedure based on reactive ion etching developed to reduce the surface roughness of CVD diamond thin films. The technique involves etching a bilayer made up of diamond and a planarizing SiO 2 layer in an SF 6O 2 plasma mixture. Etching conditions have been determined which y...
Saved in:
Published in | Diamond and related materials Vol. 5; no. 6; pp. 840 - 844 |
---|---|
Main Authors | , , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Amsterdam
Elsevier B.V
01.05.1996
Elsevier |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | This paper describes a procedure based on reactive ion etching developed to reduce the surface roughness of CVD diamond thin films. The technique involves etching a bilayer made up of diamond and a planarizing SiO
2 layer in an SF
6O
2 plasma mixture. Etching conditions have been determined which yield equal rates for both diamond and the SiO
2 coverlayer and favour the removal of diamond peaks. Smoothed surfaces have been characterized by SEM, AFM and XPS: the results exhibit a significant decrease in roughness. This novel technique offers promising prospects for polishing thin diamond membranes for X-ray lithography applications without the removal of significant amounts of diamond material. The optical transmittance of diamond membranes, mainly affected by light scattering due to surface roughness, is significantly improved using this method of planarization. |
---|---|
ISSN: | 0925-9635 1879-0062 |
DOI: | 10.1016/0925-9635(95)00368-1 |