Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films

Saved in:
Bibliographic Details
Published inJournal of crystal growth Vol. 311; no. 16; pp. 4123 - 4126
Main Authors SUN, T, MA, J, YAN, Q. Y, HUANG, Y. Z, WANG, J. L, HNG, H. H
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier 01.08.2009
Subjects
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Laser deposition
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
A3. Laser epitaxy
Atomic force microscopy
68.37.Ps
Epitaxy
Laser assisted processing
A1. Surface structure
XRD
Thermoelectric properties
Surface structure
61.05.cp
Thin films
A1. Atomic force microscopy
B1. Oxides
72.80.Ga
Electrical properties
Pulsed laser deposition
Seebeck effect
Deposition rate
Crystallinity
A1. X-ray diffraction
Film growth
Electrical measurement
73.50.Lw
Transmission electron microscopy
Electric resistivity
Laser ablation technique
Coalescence
Microstructure
Online AccessGet full text

Cover

More Information
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2009.06.044