Thermoluminescence of aluminum oxide thin films subject to ultraviolet irradiation

• Published in: Thin solid films Vol. 433; no. 1; pp. 126 - 130
• Main Authors: Escobar-Alarcón, L., Villagrán, E., Camps, E., Romero, S., Villarreal-Barajas, J.E., González, P.R.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Lausanne Elsevier B.V 02.06.2003; Elsevier Science
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Exact sciences and technology; Insulators; Laser ablation; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of specific thin films; Other luminescence and radiative recombination; Physics; Thermoluminescence; Thin film; Laser ablation; Thermoluminescence; Thin film; Radiation effects; Scanning electron microscopy; Inorganic compounds; Pulsed laser deposition; XRD; Amorphous state; Experimental study; Fabrication property relation; Thin films; Ultraviolet radiation; Defect formation; Aluminium oxides
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/S0040-6090(03)00325-0

The thermoluminescence (TL) properties of amorphous aluminum oxide thin films subjected to ultraviolet (UV) irradiation are reported. Aluminum oxide thin films were prepared by laser ablation from an α -Al 2O 3 target using Nd:YAG laser with emission at the fundamental line. Compositional, structural and morphological properties of the obtained thin films as a function of the growth conditions have been studied. Experimental results show that amorphous aluminum oxide thin films with atomic concentrations of aluminum and oxygen close to those of stoichiometric Al 2O 3 and with splashed particles on its surface were obtained. The TL response as a function of the growth parameters has been investigated in order to improve such response. Thermoluminescence glow curves exhibited one peak centered at 174 °C. The results presented in this work, shows that it is possible to obtain materials in thin film form with thickness as low as 150 nm, which exhibits TL response to UV irradiation. These results suggest that aluminum oxide thin films are suitable for detection and monitoring of UV light.