Dynamics of silicon plume generated by laser ablation and its chemical reaction

Chemical reaction of laser-ablated silicon particles with oxygen gas diluted with a helium buffer gas is found by means of soft X-ray absorption spectroscopy. In order to make clear the dynamics of silicon laser plume and the mechanism of the chemical reaction, we measured time-resolved spatial dist...

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Bibliographic Details
Published inApplied surface science Vol. 96-98; pp. 242 - 250
Main Authors Makimura, T., Murakami, K.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.04.1996
Elsevier Science
Subjects
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Feathers
Emission spectra
Chemical reactions
Laser ablation technique
Silicon
X-ray spectra
Absorption spectra
Experimental study
Particles
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Summary:Chemical reaction of laser-ablated silicon particles with oxygen gas diluted with a helium buffer gas is found by means of soft X-ray absorption spectroscopy. In order to make clear the dynamics of silicon laser plume and the mechanism of the chemical reaction, we measured time-resolved spatial distribution of light emission from the laser-ablated particles as well as time- and space-resolved emission spectra.
ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(95)00428-9