MOCVD methods for fabricating GaAs quantum wires and quantum dots

Semiconductor low-dimensional structures such as quantum wires and quantum dots fabricated by metalorganic chemical vapor deposition (MOCVD) are reported. GaAs/AlAs quantum wire arrays including fractional-layer superlattices were grown on (001) GaAs vicinal surfaces. Uniform lateral superlattices w...

Full description

Saved in:
Bibliographic Details
Published inJournal of crystal growth Vol. 124; no. 1; pp. 493 - 496
Main Authors Fukui, Takashi, Saito, Hisao, Kasu, Makoto, Ando, Seigo
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.11.1992
Elsevier
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Semiconductor low-dimensional structures such as quantum wires and quantum dots fabricated by metalorganic chemical vapor deposition (MOCVD) are reported. GaAs/AlAs quantum wire arrays including fractional-layer superlattices were grown on (001) GaAs vicinal surfaces. Uniform lateral superlattices were observed by transmission electron microscopy. However, polarization-dependent photoluminescence and the optical absorption spectra suggest that significant alloying occurs in AlAs/GaAs vertical interfaces. GaAs tetrahedral quantum dots buried in AlGaAs were also fabricated on a SiO 2 masked (111)B GaAs substrate partially etched to a triangular shape. First, AlGaAs truncated tetrahedral structures with three {110} facets were grown on GaAs triangular areas. Next, GaAs dot structures were sequentially grown on top of the AlGaAs truncated tetrahedron. Finally, AlGaAs was over-grown on {110} sidewall facets with a different growth condition. We observed large quantum size effects for about 100 nm TQD in low temperature photoluminescence, which is in good agreement with calculations.
ISSN:0022-0248
1873-5002
DOI:10.1016/0022-0248(92)90505-D