MOCVD methods for fabricating GaAs quantum wires and quantum dots
Semiconductor low-dimensional structures such as quantum wires and quantum dots fabricated by metalorganic chemical vapor deposition (MOCVD) are reported. GaAs/AlAs quantum wire arrays including fractional-layer superlattices were grown on (001) GaAs vicinal surfaces. Uniform lateral superlattices w...
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Published in | Journal of crystal growth Vol. 124; no. 1; pp. 493 - 496 |
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Main Authors | , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Amsterdam
Elsevier B.V
01.11.1992
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Semiconductor low-dimensional structures such as quantum wires and quantum dots fabricated by metalorganic chemical vapor deposition (MOCVD) are reported. GaAs/AlAs quantum wire arrays including fractional-layer superlattices were grown on (001) GaAs vicinal surfaces. Uniform lateral superlattices were observed by transmission electron microscopy. However, polarization-dependent photoluminescence and the optical absorption spectra suggest that significant alloying occurs in AlAs/GaAs vertical interfaces. GaAs tetrahedral quantum dots buried in AlGaAs were also fabricated on a SiO
2 masked (111)B GaAs substrate partially etched to a triangular shape. First, AlGaAs truncated tetrahedral structures with three {110} facets were grown on GaAs triangular areas. Next, GaAs dot structures were sequentially grown on top of the AlGaAs truncated tetrahedron. Finally, AlGaAs was over-grown on {110} sidewall facets with a different growth condition. We observed large quantum size effects for about 100 nm TQD in low temperature photoluminescence, which is in good agreement with calculations. |
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ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/0022-0248(92)90505-D |