Excimer laser ablation of polymers and glasses for grating fabrication

In this paper we describe studies carried out related to grating formation for optoelectronics applications using 248 nm and 193 nm excimer lasers. These include basic studies of UV laser induced incubation and ablation of various glasses, and an evaluation of laser-induced-periodic-surface-structur...

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Bibliographic Details
Published inApplied surface science Vol. 96-98; pp. 537 - 549
Main Authors Dyer, P.E., Farley, R.J., Giedl, R., Karnakis, D.M.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.04.1996
Elsevier Science
Subjects
Application fields
Applied sciences
Exact sciences and technology
Polymer industry, paints, wood
Technology of polymers
Optoelectronics
Excimer
Use
Laser
Glass
Polymer
Manufacturing
Ablation
Grafting
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Summary:In this paper we describe studies carried out related to grating formation for optoelectronics applications using 248 nm and 193 nm excimer lasers. These include basic studies of UV laser induced incubation and ablation of various glasses, and an evaluation of laser-induced-periodic-surface-structures (LIPSS) and UV holographic techniques based on a phase mask for forming gratings on polymers and in fibres. Modelling and experiments show that the use of excimer laser illuminated phase masks in a contact printing mode or Talbot reimaging arrangement provide a particularly effective approach to forming submicron period gratings.
ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(95)00528-5