Ion-beam-induced electrical conductivity in plasma-polymerized aniline film
Plasma-polymerized organic films starting from aniline have been prepared. Characteristics of the films have been examined in detail using FT-IR, X-ray photoelectron spectroscopy (XPS), near-IR to UV spectroscopy and nuclear analysis techniques. While irradiation by 100 keV Ar + ions at high fluence...
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Published in | Synthetic metals Vol. 68; no. 2; pp. 125 - 131 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier B.V
1995
Amsterdam Elsevier Science New York, NY |
Subjects | |
Online Access | Get full text |
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Summary: | Plasma-polymerized organic films starting from aniline have been prepared. Characteristics of the films have been examined in detail using FT-IR, X-ray photoelectron spectroscopy (XPS), near-IR to UV spectroscopy and nuclear analysis techniques. While irradiation by 100 keV Ar
+ ions at high fluence induces electrical conduction due to damage, doping of the plasma-polymerized aniline film with 24 keV I
+ implantation at a fluence of 1 × 10
16 ions/cm
2 results in a decrease of electrical resistivity by twelve orders of magnitude. A threshold-like dependence of resistivity on the ion fluence has been found for the plasma-polymerized film irradiated by 100 keV Ar
+ ions, similar to conventional polymers. |
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ISSN: | 0379-6779 1879-3290 |
DOI: | 10.1016/0379-6779(94)02281-3 |