Ion-beam-induced electrical conductivity in plasma-polymerized aniline film

Plasma-polymerized organic films starting from aniline have been prepared. Characteristics of the films have been examined in detail using FT-IR, X-ray photoelectron spectroscopy (XPS), near-IR to UV spectroscopy and nuclear analysis techniques. While irradiation by 100 keV Ar + ions at high fluence...

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Bibliographic Details
Published inSynthetic metals Vol. 68; no. 2; pp. 125 - 131
Main Authors Tong, Zhi Shen, Wu, Mei Zhen, Pu, Tian Shu, Zhou, Fu, Liu, Hui Zhen
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier B.V 1995
Amsterdam Elsevier Science
New York, NY
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Summary:Plasma-polymerized organic films starting from aniline have been prepared. Characteristics of the films have been examined in detail using FT-IR, X-ray photoelectron spectroscopy (XPS), near-IR to UV spectroscopy and nuclear analysis techniques. While irradiation by 100 keV Ar + ions at high fluence induces electrical conduction due to damage, doping of the plasma-polymerized aniline film with 24 keV I + implantation at a fluence of 1 × 10 16 ions/cm 2 results in a decrease of electrical resistivity by twelve orders of magnitude. A threshold-like dependence of resistivity on the ion fluence has been found for the plasma-polymerized film irradiated by 100 keV Ar + ions, similar to conventional polymers.
ISSN:0379-6779
1879-3290
DOI:10.1016/0379-6779(94)02281-3