The FDTD analysis for dark field in-process depth measurements of fine microgrooves

Microstructures are widely used in the manufacture of functional surfaces. An optical-based in-process and non-invasive method is preferred for the depth measurement of the fine microgroove structure. A dark-field method is proposed using the features of polarization based on the waveguide theory. A...

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Bibliographic Details
Published inMeasurement. Sensors Vol. 18; p. 100257
Main Authors Guan, Yizhao, Kadoya, Shotaro, Michihata, Masaki, Takahashi, Satoru
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.12.2021
Elsevier
Subjects
Dark-field
Depth measurement
FDTD
Microgroove
Microgroove
Dark-field
Depth measurement
FDTD
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Summary:Microstructures are widely used in the manufacture of functional surfaces. An optical-based in-process and non-invasive method is preferred for the depth measurement of the fine microgroove structure. A dark-field method is proposed using the features of polarization based on the waveguide theory. According to the numerical simulation based on the FDTD method and Fourier optics, the proposed method allows depth measurement for fine microgroove having an aperture size of less than several hundred nanometers with an aspect ratio (width/depth) of larger than one, even under the far-field measurement.
ISSN:2665-9174
2665-9174
DOI:10.1016/j.measen.2021.100257