Enhanced cold wall CVD reactor growth of horizontally aligned single-walled carbon nanotubes
HASynthesis of horizontally-aligned single-walled carbon nanotubes (HA-SWCNTs) by chemical vapor deposition (CVD) directly on quartz seems very promising for the fabrication of future nanoelectronic devices. In comparison to hot-wall CVD, synthesis of HA-SWCNTs in a cold-wall CVD chamber not only me...
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Published in | Electronic materials letters Vol. 12; no. 3; pp. 329 - 337 |
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Main Authors | , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Seoul
The Korean Institute of Metals and Materials
01.05.2016
대한금속·재료학회 |
Subjects | |
Online Access | Get full text |
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Summary: | HASynthesis of horizontally-aligned single-walled carbon nanotubes (HA-SWCNTs) by chemical vapor deposition (CVD) directly on quartz seems very promising for the fabrication of future nanoelectronic devices. In comparison to hot-wall CVD, synthesis of HA-SWCNTs in a cold-wall CVD chamber not only means shorter heating, cooling and growth periods, but also prevents contamination of the chamber. However, since most synthesis of HA-SWCNTs is performed in hot-wall reactors, adapting this well-established process to a cold-wall chamber becomes extremely crucial. Here, in order to transfer the CVD growth technology from a hot-wall to a cold-wall chamber, a systematic investigation has been conducted to determine the influence of process parameters on the HA-SWCNT’s growth. For two reasons, the cold-wall CVD chamber was upgraded with a top heater to complement the bottom substrate heater; the first reason to maintain a more uniform temperature profile during HA-SWCNTs growth, and the second reason to preheat the precursor gas flow before projecting it onto the catalyst. Our results show that the addition of a top heater had a significant effect on the synthesis. Characterization of the CNTs shows that the average density of HA-SWCNTs is around 1 - 2 tubes/
μ
m with high growth quality as shown by Raman analysis. |
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Bibliography: | G704-SER000000579.2016.12.3.006 |
ISSN: | 1738-8090 2093-6788 2093-6788 |
DOI: | 10.1007/s13391-016-6012-6 |