Structure and optical properties of Si and SiGe layers grown on SiO2 by chemical vapor deposition

• Published in: Thin solid films Vol. 579; pp. 131 - 135
• Main Authors: Shklyaev, A.A., Vdovin, V.I., Volodin, V.A., Gulyaev, D.V., Kozhukhov, A.S., Sakuraba, M., Murota, J.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 31.03.2015
• Subjects: Chemical vapor deposition; Crystal defects; Depth indicators; Optical properties; Photoluminescence; Polycrystalline structure; Silicon; Silicon dioxide; Silicon germanides; Silicon germanium; Surface morphology; Thin films; Surface morphology; Photoluminescence; Polycrystalline structure; Silicon; Chemical vapor deposition; Silicon dioxide; Silicon germanium
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2015.02.076

The properties of thin Si and SiGe layers grown on SiO2 by chemical vapor deposition (CVD) were studied using transmission electron and atomic force microscopies, and Raman and photoluminescence (PL) spectroscopies. The layers with a composition of Si0.5Ge0.5 become composed of nanocrystals with an average size of about 100nm at growth temperatures of 550°C which is significantly lower than that for the pure Si layers. Moreover, the Si0.5Ge0.5 layers exhibit a broad PL peak centered at 0.8eV, whereas the bandgap of unstrained Si0.5Ge0.5 is about 1eV. This indicates that PL occurs through deep energy levels in the bandgap, which can be associated with crystal defects. The predominance of deep-level PL in radiative emission can be the result of a high concentration of defects that appear due to a low growth temperature. •The Si0.5Ge0.5 layers grown on SiO2 become polycrystalline at 550°C.•They exhibit a PL peak at 0.8eV, whereas the Si0.5Ge0.5 bandgap is about 1eV.•Such properties make the layers interesting for applications in photonics.