Synthesis of bisphenol A‐free oligomeric phthalonitrile resins with sulfone and sulfone‐ketone containing backbones

Two new oligomeric sulfone and sulfone‐ketone containing phthalonitrile (PN) resins with excellent processability have been developed. The PN monomers were prepared from the reaction of an excess amount of bisphenol S with 4‐(chlorophenyl)sulfone or 4,4‐dichlorobenzophenone in the presence of a base...

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Bibliographic Details
Published inJournal of polymer science. Part A, Polymer chemistry Vol. 54; no. 11; pp. 1639 - 1646
Format Journal Article
LanguageEnglish
Published Wiley 01.06.2016
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Summary:Two new oligomeric sulfone and sulfone‐ketone containing phthalonitrile (PN) resins with excellent processability have been developed. The PN monomers were prepared from the reaction of an excess amount of bisphenol S with 4‐(chlorophenyl)sulfone or 4,4‐dichlorobenzophenone in the presence of a base in a solvent mixture (dimethylsulfoxide/toluene), followed by end‐capping with 4‐nitro‐PN in a two‐step, one‐pot reaction. These PN resins exhibited good viscosities and cure times for molding into various shapes. After being thermally cured to yield crosslinked polymers, these polymers demonstrated superb mechanical properties, thermo‐oxidative stability, and maintained good dielectric properties.
Bibliography:http://dx.doi.org/10.1002/pola.28020
ISSN:0887-624X
1099-0518
DOI:10.1002/pola.28020