Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications
We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400 ∘ C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show...
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Published in | Applied physics. A, Materials science & processing Vol. 106; no. 3; pp. 737 - 745 |
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Main Authors | , , , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Berlin/Heidelberg
Springer-Verlag
01.03.2012
Springer Springer Verlag |
Subjects | |
Online Access | Get full text |
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Summary: | We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400
∘
C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show a good quality of the multilayer structure. The measurements of the EUV reflectivity around 25 nm (∼49 eV) indicate that the reflectivity decreases when the annealing temperature increases above 300
∘
C. X-ray emission spectroscopy is performed to determine the chemical state of the Mg atoms within the Mg/Co multilayer. Nuclear magnetic resonance used to determine the chemical state of the Co atoms and scanning electron microscopy images of cross sections of the Mg/Co multilayers reveal changes in the morphology of the stack from an annealing temperature of 305
∘
C. This explains the observed reflectivity loss. |
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ISSN: | 0947-8396 1432-0630 |
DOI: | 10.1007/s00339-011-6681-9 |