Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications

We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400 ∘ C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show...

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Bibliographic Details
Published inApplied physics. A, Materials science & processing Vol. 106; no. 3; pp. 737 - 745
Main Authors Hu, M.-H., Le Guen, K., André, J.-M., Zhou, S. K., Li, H. C., Zhu, J. T., Wang, Z. S., Meny, C., Mahne, N., Giglia, A., Nannarone, S., Estève, I., Walls, M., Jonnard, P.
Format Journal Article
LanguageEnglish
Published Berlin/Heidelberg Springer-Verlag 01.03.2012
Springer
Springer Verlag
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Summary:We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400 ∘ C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show a good quality of the multilayer structure. The measurements of the EUV reflectivity around 25 nm (∼49 eV) indicate that the reflectivity decreases when the annealing temperature increases above 300 ∘ C. X-ray emission spectroscopy is performed to determine the chemical state of the Mg atoms within the Mg/Co multilayer. Nuclear magnetic resonance used to determine the chemical state of the Co atoms and scanning electron microscopy images of cross sections of the Mg/Co multilayers reveal changes in the morphology of the stack from an annealing temperature of 305 ∘ C. This explains the observed reflectivity loss.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-011-6681-9