Determination of refractive index and layer thickness of nm-thin films via ellipsometry

• Published in: Optics express Vol. 25; no. 22; pp. 27077 - 27085
• Main Authors: Nestler, Peter, Helm, Christiane A
• Format: Journal Article
• Language: English
• Published: United States 30.10.2017
• ISSN: 1094-4087; 1094-4087
• DOI: 10.1364/oe.25.027077

Ellipsometric measurements give information on two film properties with high precision, thickness and refractive index. In the simplest case, the substrate is covered with a single homogenous, transparent film. Yet, with ellipsometry, it is only possible to determine the two film properties thickness and refractive simultaneously if the layer thickness exceeds 15 nm - a restriction well known for a century. Here we present a technique to cross this limitation: A series expansion of the ellipsometric ratio ρ to the second order of the layer thickness relative to the wavelength reveals the first and second ellipsometric moment. These moments are properties of the thin film and independent of incident angle. Using both moments and one additional reference measurement enables to determine simultaneously both thickness and refractive index of ultra-thin films down to 5 nm thickness.