Creating electron phase holograms using femtosecond laser interference processing

Recently, electron beams with structured phase fronts, such as electron vortex beams, have attracted considerable interest. Herein, we present a novel method of fabricating electron phase holograms using a femtosecond laser interference processing. A 35-nm-thick silicon membrane, corresponding to a...

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Published inOptics express Vol. 27; no. 15; pp. 20958 - 20964
Main Authors Uesugi, Yuuki, Fukushima, Ryota, Saitoh, Koh, Sato, Shunichi
Format Journal Article
LanguageEnglish
Published United States 22.07.2019
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Summary:Recently, electron beams with structured phase fronts, such as electron vortex beams, have attracted considerable interest. Herein, we present a novel method of fabricating electron phase holograms using a femtosecond laser interference processing. A 35-nm-thick silicon membrane, corresponding to a phase shift of π for 200-keV electrons, was processed using single-shot laser irradiation, whereas processing such thin membranes with a focused ion beam milling technique would be very difficult. This rapid and efficient technique is expected to produce phase diffraction elements for practical applications in a wide range of electron optics fields.
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ISSN:1094-4087
1094-4087
DOI:10.1364/oe.27.020958