Effect of Molecular Weight and Protection Ratio on Latent Image Fluctuation of Chemically Amplified Extreme Ultraviolet Resists
Line edge roughness (LER) has been the most serious problem in the development of high-resolution lithography for manufacturing semiconductor devices. LER is caused by the stochastic effects in resist pattern formation. In this study, the effects of the molecular weight and protection ratio of a res...
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| Published in | Japanese Journal of Applied Physics Vol. 51; no. 12; pp. 126501 - 126501-4 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
The Japan Society of Applied Physics
01.12.2012
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| Online Access | Get full text |
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| Summary: | Line edge roughness (LER) has been the most serious problem in the development of high-resolution lithography for manufacturing semiconductor devices. LER is caused by the stochastic effects in resist pattern formation. In this study, the effects of the molecular weight and protection ratio of a resist backbone polymer on latent image fluctuation were investigated by a Monte Carlo method. From the viewpoint of latent image fluctuation, a high molecular weight and a high protection ratio were found to be favorable for the reduction in LER. |
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| Bibliography: | Distribution of protected units at the half depth of the resist film. The vertical axis represents the number of protected units per polymer. $\sigma$ represents the standard deviation of protected unit distribution. The molecular weights of the backbone polymers were (a) 4000, (b) 2000, and (c) 1000. The protection ratio was 30%. Histogram of the number of protected units per polymer at $x =\pm 8$ nm. The molecular weights of the backbone polymers were (a) 4000, (b) 2000, and (c) 1000. The protection ratio was 30%. Distribution of protected units at the half depth of the resist film. The vertical axis represents the number of protected units per polymer. $\sigma$ represents the standard deviation of the protected unit distribution. The protection ratios of the backbone polymers were (a) 20 and (b) 10%. The molecular weight of the backbone polymer was 4000. Histogram of the number of protected units per polymer at $x =\pm 8$ nm. The protection ratios of the backbone polymers were (a) 20 and (b) 10%. The molecular weight of the backbone polymer was 4000. |
| ISSN: | 0021-4922 1347-4065 |
| DOI: | 10.1143/JJAP.51.126501 |