CHARACTERISTICS OF THREE-DIMENSIONAL FLOW, HEAT, AND MASS TRANSFER IN A CHEMICAL VAPOR DEPOSITION REACTOR

• Published in: Numerical heat transfer. Part A, Applications Vol. 37; no. 4; pp. 407 - 423
• Main Author: Pak, Kyoung-Woo Park, Hi-Yong
• Format: Journal Article
• Language: English
• Published: London Informa UK Ltd 01.03.2000; Taylor & Francis
• Subjects: CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Cross-disciplinary physics: materials science; rheology; ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; Exact sciences and technology; FLUID FLOW; HEAT TRANSFER; MASS TRANSFER; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; NUMERICAL ANALYSIS; Physics; Theory and models of film growth; THREE-DIMENSIONAL CALCULATIONS; CVD; Flow(fluid); Theoretical study; Hydrodynamics; Numerical method; Kinetics; Chemical reactors; Heat transfer; Mass transfer
• ISSN: 1040-7782; 1521-0634
• DOI: 10.1080/104077800274253

The three-dimensional flow, heat, and mass transfer characteristics in a horizontal chemical vapor deposition (CVD) reactor with a tilted susceptor are analyzed numerically. As the physical domain for the CVD reactor has an irregular region, the Cartesian coordinates are transformed into a general curvilinear coordinate system. For calculating the governing equations, the finite volume method (FVM) is adopted and the SIMPLE algorithm is extended and modified to employ the curvilinear system. The effects of flow rate and tilted angle of the susceptor on the transport phenomena (i.e., heat transfer rate, uniformity and growth rate of reactant gas, etc.) at the susceptor are investigated. The results show that the existence of return flows leads locally to improvement of the heat transfer, but it is not good for the uniformity of the deposition. As the tilted angle of the susceptor is increased (from 0 o to 9 o ), the amount of heat transfer and growth rate in the main flow direction are improved irrespective of the Reynolds number. The growth rate and uniformity are less sensitive to the inclined angle of the susceptor than that of the Reynolds number.