Analysis of textured films and periodic grating structures with Mueller matrices: A new challenge in instrumentation with the generation of angle-resolved SE polarimeters

• Published in: Thin solid films Vol. 519; no. 9; pp. 2608 - 2612
• Main Authors: Ferrieu, F., Novikova, T., Fallet, C., Ben Hatit, S., Vannuffel, C., De Martino, A.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 28.02.2011; Elsevier
• Subjects: Angle-resolved polarimeter; Anisotropy; Condensed matter: structure, mechanical and thermal properties; Ellipsometer; Exact sciences and technology; Gratings; Gratings (spectra); Instrumentation; Instruments, apparatus, components and techniques common to several branches of physics and astronomy; Matrices; Mueller matrix; Optical instruments, equipment and techniques; Periodic structures; Photonics structure; Physics; Polarimeters; Polarimeters and ellipsometers; Polarimetry; Roughness; Scatterometry; Structure and morphology; thickness; Surface analysis; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; Thin films; Scatterometry; Ellipsometer; Angle-resolved polarimeter; Mueller matrix; Instrumentation; Photonics structure; Polarimetry; Surface analysis; Gratings; Periodic structures; Angular resolution; Spectroscopic ellipsometry; Digital simulation; Roughness; Size measurement; Microelectronics; Thin films; Depolarization; Anisotropy; Birefringence
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2010.12.062

Current Mueller polarimeters, with either spectral or angular resolution, feature high enough precision and speed to be suitable for many demanding applications, with specific advantages over conventional spectroscopic ellipsometry (SE). Due to the simultaneous determination of depolarization, birefringence and diattenuation Mueller polarimetry (MP) can open new fields in surface and thin film characterization techniques with new and very powerful intrinsic analyses of roughness and/or anisotropy. For more conventional applications, such as scatterometry (i.e. the determination of the shape of periodic structures from optical measurements, mostly used in microelectronics), MP may overpass SE in terms of systematic errors and/or measurement spot size, as discussed from two examples. However, numerical simulations remain a key point to take full advantage of MP capabilities for the new challenges emerging in nanometrology.